MICROMETHOD OF SURFACE-ROUGHNESS MEASUREMENT WITH SEM

被引:0
|
作者
NG, WY [1 ]
CHAN, KD [1 ]
LAU, MK [1 ]
机构
[1] POLYTECH HONG KONG,FAC SCI & TECHNOL,LAB CTR,HONG KONG,HONG KONG
来源
PLATING AND SURFACE FINISHING | 1993年 / 80卷 / 07期
关键词
D O I
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中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
A method that makes use of the scanning electro microscope has been developed to measure the roughness of a microscopic sample, such as the top of a connecting post of a TO-5 semiconductor package. The electron beam of the SEM scans along a surface The intensity of emitted secondary electrons, while reveal the surface profile, is recorded on a photographic plate. The resulting curve is digitized and the roughness is estimated. The results obtained by this method compare favorably with the conventional profilometric method.
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页码:48 / 50
页数:3
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