THE CHEMICAL-REACTIVITY OF OXIDIZED LEAD SURFACES STUDIED BY XPS - THE MECHANISM OF HALOGEN-INDUCED SURFACE ETCHING

被引：0
|
作者：
CARLEY, AF
ROBERTS, MW
机构：
[1] Univ Coll, United Kingdom
来源：
VACUUM | 1988年 / 38卷 / 4-5期
关键词：
D O I：
10.1016/0042-207X(88)90088-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
8
引用
收藏
页码：397 / 399
页数：3
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