X-RAY-DIFFRACTION AND EXAFS STUDIES OF SPUTTER-DEPOSITED TI-PD FILMS

被引：2

作者：

YAMADA, M ^{[1
]}

TSUNODA, H ^{[1
]}

TANAKA, K ^{[1
]}

SUMIYAMA, K ^{[1
]}

机构：

[1] TOHOKU UNIV, INST MAT RES, AOBA KU, SENDAI, MIYAGI 980, JAPAN

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1991年 / 134卷

关键词：

D O I：

10.1016/0921-5093(91)90904-2

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The structure of amorphous Ti(1-x)Pd(x) (0.34 less-than-or-equal-to x less-than-or-equal-to 0.48) films produced by RF sputtering has been studied by X-ray diffraction and EXAFS (extended X-ray absorption-edge fine structure) measurements. The peak parameters and the coordination numbers derived from the radial distribution function analysis of X-ray diffraction have no distinct composition dependence. EXAFS data also show no specific compositional dependence of the pair distances of Ti-Ti, Ti-Pd and Pd-Pd correlations. Thus Ti(1-x)Pd(x) amorphous films produced by sputtering are considered to have nearly identical structures in this limited composition range.

引用

页码：975 / 978

页数：4

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