DEPOSITION OF PLATINUM FROM PT(PF3)4 ON ATOMICALLY CLEAN PLATINUM SURFACES

被引：6
|
作者：
ZHANG, R [1 ]
COMITA, PB [1 ]
机构：
[1] IBM CORP,DIV RES,ALMADEN RES CTR,650 HARRY RD,SAN JOSE,CA 95120
来源：
CHEMICAL PHYSICS LETTERS | 1992年 / 200卷 / 03期
关键词：
D O I：
10.1016/0009-2614(92)80014-3
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The surface reactions of Pt(PF3)4 on Pt(111) and polycrystalline platinum have been examined under ultra-high vacuum conditions using Auger electron spectroscopy, temperature programmed desorption and secondary ion mass spectrometry techniques. For both surfaces, the dissociation of Pt (PF3)4 on platinum takes place below 500 K and gives rise to an intermediate state in which PF3 is chemisorbed on the platinum surface. On Pt(111) single crystal surface, a condensed state of Pt(PF3)4 is observed at 170 K for high coverage dosing. On a polycrystalline Pt surface, a desorption state of the reactant occurs at very high temperature, presumably from a recombination reaction of chemisorbed surface fragments.
引用
收藏
页码：297 / 302
页数：6
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