SELECTIVE GAAS/ALGAAS RIE ETCHING USING SICL4/CF4/HE GAS-MIXTURE

被引：0
|
作者：
MIZUNUMA, Y
MURAKAMI, Y
机构：
来源：
DENKI KAGAKU | 1991年 / 59卷 / 12期
关键词：
MMIC; HEMT; RECESS; FLUOROCARBON; SELECTIVE-ETCHING;
D O I：
10.5796/kogyobutsurikagaku.59.1077
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1077 / 1078
页数：2
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