A REFINED SALICIDE (SELF-ALIGNED SILICIDE) TECHNOLOGY FOR CMOS PROCESSING

被引：0
|
作者：
NORSTROM, H [1 ]
BUCHTA, R [1 ]
LINDBERG, A [1 ]
JOHANSSON, T [1 ]
GUSTAFSSON, U [1 ]
NYGREN, S [1 ]
OSTLING, M [1 ]
PETERSSON, CS [1 ]
机构：
[1] INST MICROWAVE TECHNOL,S-10044 STOCKHOLM,SWEDEN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C123 / C124
页数：2
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