LASER OPTOGALVANIC ANALYSIS OF NITROGEN LAYERS IN HOLLOW-CATHODE GLOW-DISCHARGE

被引：7
|
作者：
DJULGEROVA, R
MIHAILOV, V
机构：
[1] Institute of Solid State Physics-BAS Blvd, Sofia, 1784
来源：
SPECTROSCOPY LETTERS | 1993年 / 26卷 / 02期
关键词：
HOLLOW CATHODE DISCHARGE; OPTOGALVANIC EFFECT; PHOTOELECTRIC OPTOGALVANIC EFFECT; LAYER AND SURFACE ANALYSIS;
D O I：
10.1080/00387019308011536
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
This experimental investigation shows that the replacement of the spectral line intensity by the optogalvanic and photoelectric optogalvanic signals improves the accuracy of the classical direct layer-by-layer analysis in a hollow cathode glow discharge and its possibilities, for example for layer thickness measurements in some cases.
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页码：347 / 358
页数：12
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