Preparation of Nickel Oxide Films by Anodizing

被引：0

作者：

Kim, Youngjin ^{[1
]}

Jung, Jihoon ^{[1
]}

机构：

[1] Kyonggi Univ, Dept Chem Engn, 94-6 Yiui Dong, Suwon 443760, Gyeonggi Do, South Korea

来源：

KOREAN CHEMICAL ENGINEERING RESEARCH | 2012年 / 50卷 / 02期

关键词：

Nickel; Nickel Oxide; Anodizing; Thin Film;

D O I：

暂无

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Nickel oxide thin films with 2.3 mu m thickness were prepared in order to overcome limitations of thickness with nm dimension by anodizing. For the electrolyte, ethylene glycol was used as solvent, and NH4F was added for source of F- ions. The anodizing experiments were carried out on various voltages such as 40, 60 V and 80 V for 12 hours. The thickness of NiO was changed according to the anodizing time and the voltage. However, destruction of Ni caused by rapid oxidation reaction occurred at 80 V. XRD results show that NiO was successfully created by anodizing.

引用

页码：204 / 210

页数：7

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