OPTICAL-PROPERTIES OF AMORPHOUS-CARBON THIN-FILMS PREPARED BY PLASMA DEPOSITION IN A GRAPHITE HOLLOW-CATHODE

Carbon films have been produced using a graphite hollow cathode and an r.f plasma of hydrogen or hydrogen and argon. No hydrocarbon gas was used. The films were subjected to heat treatments up to 700-degrees-C in air. The optical properties of the films were studied using Fourier tranform IR, UV-visible, Raman, ellipsometry and photoluminescence techniques before and after the annealing. Films prepared without argon have a narrower band gap and a different photoluminescence response from films prepared with argon. The index of refraction was seen to have values between 1.7 and 2.2 depending on the preparation conditions. The optical band gap of the films was generally greater than 2 eV and the annealing process both increased the gap and reduced the density of states responsible for the large photoluminescence signal.