EFFECTS OF DEEP IMPURITIES ON N+P JUNCTION REVERSE-BIASED SMALL-SIGNAL CAPACITANCE

被引:128
作者
SCHIBLI, E
MILNES, AG
机构
关键词
D O I
10.1016/0038-1101(68)90044-0
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:323 / +
页数:1
相关论文
共 11 条
[1]  
BARRERA JS, 1967, THESIS CARNEGIE I TE
[2]   PROPERTIES OF GOLD IN SILICON [J].
BULLIS, WM .
SOLID-STATE ELECTRONICS, 1966, 9 (02) :143-&
[3]   CAPACITANCE OF P-N JUNCTIONS - SPACE-CHARGE CAPACITANCE [J].
CHANG, YF .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) :2337-&
[4]  
KROKO LJ, 1966, THESIS CARNEGIE I TE
[5]  
PRITCHARD RL, 1959, SEMICOND PROD, V2, P31
[7]  
SAH CT, 1967, PR INST ELECTR ELECT, V55, P672
[8]   FREQUENCY DEPENDENCE OF REVERSE-BIASED CAPACITANCE OF GOLD-DOPED SILICON P+N STEP JUNCTIONS [J].
SAH, CT ;
REDDI, VGK .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1964, ED11 (07) :345-+
[9]   THE THEORY OF P-N JUNCTIONS IN SEMICONDUCTORS AND P-N JUNCTION TRANSISTORS [J].
SHOCKLEY, W .
BELL SYSTEM TECHNICAL JOURNAL, 1949, 28 (03) :435-489
[10]  
THOMPSON C, 1964, AEU, V18, P628