DUAL-POLARITY, SINGLE-RESIST MIXED (E-BEAM-PHOTO) LITHOGRAPHY

被引：4
|
作者：
BERKER, TD
BERNACKI, SE
机构：
来源：
ELECTRON DEVICE LETTERS | 1981年 / 2卷 / 11期
关键词：
D O I：
10.1109/EDL.1981.25433
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：281 / 283
页数：3
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