MOLECULAR STREAM EPITAXY AND THE ROLE OF THE BOUNDARY-LAYER IN CHEMICAL VAPOR-DEPOSITION

被引:5
|
作者
KATSUYAMA, T
BEDAIR, SM
机构
关键词
D O I
10.1063/1.341155
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:5098 / 5103
页数:6
相关论文
共 50 条
  • [21] METALORGANIC CHEMICAL VAPOR-DEPOSITION
    DAPKUS, PD
    ANNUAL REVIEW OF MATERIALS SCIENCE, 1982, 12 : 243 - 269
  • [22] DIAMOND CHEMICAL VAPOR-DEPOSITION
    CELII, FG
    BUTLER, JE
    ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1991, 42 (01) : 643 - 684
  • [23] KINETICS OF CHEMICAL VAPOR-DEPOSITION
    SUBRAHMANYAM, J
    LAHIRI, AK
    ABRAHAM, KP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (06) : 1394 - 1399
  • [24] LASERS IN CHEMICAL VAPOR-DEPOSITION
    不详
    MICROELECTRONICS AND RELIABILITY, 1973, 12 (02): : 177 - &
  • [25] HOMOGENEOUS CHEMICAL VAPOR-DEPOSITION
    SCOTT, BA
    OLBRICHT, WL
    MEYERSON, BA
    REIMER, JA
    WOLFORD, DJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 450 - 456
  • [26] CHEMICAL VAPOR-DEPOSITION OF DIAMOND
    SATO, Y
    DENKI KAGAKU, 1989, 57 (05): : 360 - 364
  • [27] CHEMICAL VAPOR-DEPOSITION OF DIAMOND
    SPEAR, KE
    FRENKLACH, M
    BADZIAN, A
    BADZIAN, T
    HARTNETT, T
    MESSIER, R
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C483 - C483
  • [28] CHEMICAL VAPOR-DEPOSITION - FOREWORD
    HITCHMAN, ML
    JOURNAL DE PHYSIQUE III, 1992, 2 (08): : U1373 - U1373
  • [29] CHEMICAL VAPOR-DEPOSITION OF RUTHENIUM
    GROSS, ME
    PAPA, LE
    GREEN, ML
    SCHNOES, KJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (03) : C88 - C88
  • [30] CHEMICAL VAPOR-DEPOSITION OF CHROMIUM
    HANNI, W
    HINTERMANN, HE
    THIN SOLID FILMS, 1977, 40 (JAN) : 107 - 114