Optical near-field probe with embedded gallium scattering center

被引：0
|
作者：
Isakov, D. V. [1 ,2 ]
Zhang, Y. [2 ]
Balk, L. J. [3 ]
Phang, J. C. H. [1 ]
机构：
[1] Natl Univ Singapore, CICFAR, Singapore 119077, Singapore
[2] Singapore Inst Mfg Technol, Precis Measurements Grp, Singapore 638075, Singapore
[3] Univ Wuppertal, Fac Elect Informat & Media Engn, D-42119 Wuppertal, Germany
来源：
APPLIED PHYSICS LETTERS | 2009年 / 94卷 / 25期
关键词：
focused ion beam technology; gallium; near-field scanning optical microscopy; optical fibres; optical glass; MICROSCOPY;
D O I：
10.1063/1.3157909
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
An optical near-field probe is proposed in which gallium is embedded into the tip of a tapered optical glass fiber to form a scattering center. Gallium is embedded by implantation during the process of probe sharpening by a raster-scanned focused ion beam. Using quasielectrostatic approximation, it is predicted that the presence of gallium should improve the scattering efficiency by an order of magnitude in comparison with a probe without gallium implantation. Imaging of a polished waveguide with different probes shows that Ga implantation can improve the efficiency by 37 times.
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页数：3
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