A miniaturized electron beam column simulation by the fast moving least square reproducing kernel point collocation method

被引:17
|
作者
Kim, DW
Kim, Y
Kim, YC
Kim, HS
Ahn, S
Park, YY
Kim, DW
机构
[1] Sun Moon Univ, Div Nat Sci, Ctr Next Generat Semicond Technol, Asan 336708, Chungnam, South Korea
[2] Yonsei Univ, Dept Math, Seoul 120749, South Korea
[3] Sun Moon Univ, Div Comp & Informat Sci, Asan 336708, Chungnam, South Korea
关键词
FMLSRK method; dilation function; electrostatic microcolumn; point collocation scheme; computational methodology; electron beam;
D O I
10.1143/JJAP.42.3842
中图分类号
O59 [应用物理学];
学科分类号
摘要
A miniaturized electron beam column, microcolumn, operated at a low electron energy of 1-2 keV has been simulated by the fast moving least square reproducing kernel point collocation method (FCM) which is a new concept of point collocation calculations. The salient feature of the method here is the use of the dilation function instead of constant dilation parameter. The simulation results of FCM for microcolumn configuration show good agreement with previous calculation and experimental results. Typically, the electron beam column design has been simulated by the finite difference method (FDM) with the grid and finite element method (FEM) based on mesh generation. However, The FCM method dilation function can readily calculate high-aspect-ratio structures employing only nodes instead of grid or mesh generation. The accuracy of this method will be proved through careful analysis of the error between numerical and analytic solutions. The full microcolumn structure consisting of electron emitter, source lens, and Einzel lens parts can be readily calculated by FCM. We will discuss the basic concept of FCM and its applications in this paper.
引用
收藏
页码:3842 / 3848
页数:7
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