Plasmonic slot waveguides: a quantum leap in nonlinear nanophotonics

被引:0
|
作者
Yanez, Libertad Rojas [1 ]
Hu, Huatian [2 ]
Ciraci, Cristian [2 ]
Palomba, Stefano [1 ]
机构
[1] Univ Sydney, Inst Photon & Opt Sci, Sch Phys, Sydney, NSW, Australia
[2] Ist Italiano Tecnol, Ctr Biomol Nanotechnol, Lecce, Italy
来源
关键词
metal-dielectric-metal slot waveguide; nonlinear plasmonics; epsilon-near-zero materials; nanophotonics; four-wave mixing; LARGE OPTICAL NONLINEARITY; COMPUTATIONAL ADVANTAGE; SILICON; OXIDE; GENERATION;
D O I
10.3389/fnano.2025.1536462
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Interest and excitement in nanophotonics-the study and control of light-matter interactions at the nanoscale-are driven by the ability to confine light to volumes well below a cubic wavelength, and, thereby, achieve extremely high intensities. This leads to light-matter interactions of unprecedented localization and strength. Such extreme behavior-both in terms of field enhancement and localization-can be achieved using plasmonic nanostructures, which concentrate light in regions much smaller than the wavelength of light, reducing the excitation power and, under certain conditions, removing phase-matching requirements in the nonlinear regime. In this study, we theoretically show that metal-dielectric-metal (MDM) slot waveguides (WGs), consisting of a thin dielectric layer sandwiched between metal films, provide the strongest confinement. We also demonstrate that integrating epsilon-near-zero (ENZ) materials within the MDM slot significantly improves the nonlinear conversion efficiency of these structures. The results show that the degenerate four-wave mixing conversion efficiency of these ENZ-MDM structures surpasses that of regular plasmonic structures and their dielectric counterparts, even under low pump power conditions, and remains robust despite higher losses in the ENZ material.
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页数:8
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