The challenges of image placement and overlay at the 90nm and 65nm nodes

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作者：
Trybula, Walter J. [1 ]
机构：
[1] International SEMATECH, 2706 Montopolis Drive, Austin, TX 78741, United States
来源：
Proc SPIE Int Soc Opt Eng | 1600年 / 286-292期
关键词：
Compendex;
D O I：
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学科分类号：
摘要：
Computer simulation - Electron beams - Fits and tolerances - Lithography - Photoresists - Semiconductor device manufacture
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