STATISTICAL ASPECTS OF ELECTRICAL MICRODISCHARGE CONDITIONS BETWEEN METAL ELECTRODES PLACED IN INDUSTRIAL VACUUM

被引：0

作者：

BERLAND, R ^{[1
]}

DUSSAUCHOY, A ^{[1
]}

机构：

[1] INST NATL SCI APPL, DEPT INFORMATIQUE, AVE ALBERT EINSTEIN, 69621 VILLEURBANNE, FRANCE

来源：

VACUUM | 1973年 / 23卷 / 11期

关键词：

D O I：

10.1016/0042-207X(73)92532-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：415 / 421

页数：7

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